Measurement of heat capacity and enthalpy of formation of nickel silicide using nanocalorimetry

被引：33

作者：

Kummamuru, Ravi K. ^{[1
,2
]}

De La Rama, Lito ^{[1
]}

Hu, Liang ^{[1
]}

Vaudin, Mark D. ^{[2
]}

Efremov, Mikhail Y. ^{[1
]}

Green, Martin L. ^{[2
]}

LaVan, David A. ^{[2
]}

Allen, Leslie H. ^{[1
]}

机构：

[1] Univ Illinois, Dept Mat Sci & Engn, Urbana, IL 61801 USA

[2] Natl Inst Stand & Technol, Div Ceram, Mat Sci & Engn Lab, Gaithersburg, MD 20899 USA

来源：

APPLIED PHYSICS LETTERS | 2009年 / 95卷 / 18期

关键词：

differential scanning calorimetry; electron backscattering; enthalpy; nickel compounds; specific heat; THIN-FILMS; GROWTH; TRANSITION; DEVICES; NISI;

D O I：

10.1063/1.3255009

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

The total enthalpy of reaction and heat capacity to 850 degrees C were measured using differential scanning nanocalorimetry (nano-DSC) for the reaction of a nickel and silicon bilayer at heating rates up to 10(6) K/s. Exothermic dips in heat capacity attributed to nickel silicide formation were found along with indications of phase changes at 430 and 550 degrees C. The postreaction phases were identified using electron backscattered diffraction. Samples with a Ni:Si molar ratio of 1.2 heated to 850 degrees C were a mixture of orthorhombic NiSi and the theta-phase (hexagonal-Ni(2)Si); samples heated to 790 degrees C resulted in predominantly NiSi.

引用

页数：3

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