High power impulse magnetron sputtering using a rotating cylindrical magnetron

被引：12

作者：

Leroy, W. P. ^{[1
]}

Mahieu, S. ^{[1
]}

Depla, D. ^{[1
]}

Ehiasarian, A. P. ^{[2
]}

机构：

[1] Univ Ghent, Dept Solid State Sci, B-9000 Ghent, Belgium

[2] Sheffield Hallam Univ, Nanotechnol Ctr PVD Res, Sheffield S1 1WB, S Yorkshire, England

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A | 2010年 / 28卷 / 01期

基金：

英国工程与自然科学研究理事会;

关键词：

DEPOSITION; IONIZATION;

D O I：

10.1116/1.3271136

中图分类号：

TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

Both the industrially favorable deposition technique, high power impulse magnetron sputtering (HIPIMS), and the industrially popular rotating cylindrical magnetron have been successfully combined. A stable operation without arcing, leaks, or other complications for the rotatable magnetron was attained, with current densities around 11 A cm(-2). For Ti and Al, a much higher degree in ionization in the plasma region was observed for the HIPIMS mode compared to the direct current mode. (C) 2010 American Vacuum Society. [DOI: 10.1116/1.3271136]

引用

页码：108 / 111

页数：4

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