Reliability Assessment of Low |Vt| Metal High-κ Gate Stacks for High Performance Applications

被引：0
|
作者：
Young, C. D. [1 ]
Bersuker, G. [1 ]
Khanal, P. [1 ]
Kang, C. Y. [1 ]
Huang, J. [1 ]
Park, C. S. [1 ]
Kirsch, P. [1 ]
Tseng, H. -H. [1 ]
Jammy, R. [1 ]
机构：
[1] SEMATECH, Austin, TX 78741 USA
来源：
PROCEEDINGS OF TECHNICAL PROGRAM: 2009 INTERNATIONAL SYMPOSIUM ON VLSI TECHNOLOGY, SYSTEMS AND APPLICATIONS | 2009年
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中图分类号：
TM [电工技术]; TN [电子技术、通信技术];
学科分类号：
0808 ; 0809 ;
摘要：
引用
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页码：65 / 66
页数：2
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