Electrochemical Etching of NiTi Alloy in a Neutral Fluoride Solution

被引:7
作者
Cattarin, Sandro [1 ]
Guerriero, Paolo [2 ]
Musiani, Marco [1 ]
Tuissi, Ausonio [3 ]
Vazquez-Gomez, Lourdes [1 ]
机构
[1] CNR, Ist Energet & Interfasi, I-35127 Padua, Italy
[2] CNR, Ist Chim Inorgan & Superf, I-35127 Padua, Italy
[3] CNR, Unita Lecco, Ist Energet & Interfasi, I-23900 Lecce, Italy
关键词
SHAPE-MEMORY ALLOYS; OXIDE LAYERS; P-SI; ELECTRODISSOLUTION; BEHAVIOR; GROWTH; METALS; MEDIA;
D O I
10.1149/1.3240335
中图分类号
O646 [电化学、电解、磁化学];
学科分类号
081704 ;
摘要
Electrochemical etching of NiTi alloy in a pH 6 fluoride solution is proposed as a convenient, less dangerous procedure than traditional chemical etching in oxidizing HF media. Anodic polarization produces protons at the electrode surface, and local acidification increases the concentration of HF that efficiently dissolves the surface oxides, promoting a sustained dissolution current that decreases with increasing mass-transfer rate. The voltammetric pattern includes a "pseudoplateau" at low potentials, in which only a metal dissolution takes place, and a steady current increase at higher potentials due to the onset of oxygen evolution. The treatment produces a semilustrous rough surface, showing a structure of shallow microscopic cavities in scanning electron microscopy images. Impedance spectra recorded in the pseudoplateau region are similar to those observed during anodic polarization of Ti in HF, and their analysis indicates a formation of a thin barrier film whose thickness increases linearly with potential. (C) 2009 The Electrochemical Society. [DOI: 10.1149/1.3240335] All rights reserved.
引用
收藏
页码:C428 / C434
页数:7
相关论文
共 21 条
[1]   Characterisation of surface oxidation of nickel-titanium alloy by ion-beam and electrochemical techniques [J].
Barison, S ;
Cattarin, S ;
Daolio, S ;
Musiani, M ;
Tuissi, A .
ELECTROCHIMICA ACTA, 2004, 50 (01) :11-18
[2]   The ability of a surface charge approach to describe barrier film growth on tungsten in acidic solutions [J].
Bojinov, M .
ELECTROCHIMICA ACTA, 1997, 42 (23-24) :3489-3498
[3]   Modelling the formation and growth of anodic passive films on metals in concentrated acid solutions [J].
Bojinov, M .
JOURNAL OF SOLID STATE ELECTROCHEMISTRY, 1997, 1 (02) :161-171
[4]   Electrodissolution of p-Si in acidic fluoride media - Modeling of the steady state [J].
Cattarin, S ;
Frateur, I ;
Musiani, M ;
Tribollet, B .
JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 2000, 147 (09) :3277-3282
[5]   Kinetic effects of alcohol addition on the anodic behavior of silicon in acid fluoride media [J].
Cattarin, S ;
Musiani, MM .
JOURNAL OF PHYSICAL CHEMISTRY B, 2006, 110 (05) :2451-2457
[6]   Nb electrodissolution in acid fluoride medium - Steady-state and impedance investigations [J].
Cattarin, S ;
Musiani, M ;
Tribollet, B .
JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 2002, 149 (10) :B457-B464
[7]  
DUERIG T, 1999, MAT SCI ENG A-STRUCT, V149, P273, DOI DOI 10.1016/S0921-5093(99)00294-4
[8]   Electrodissolution of Ti and p-Si in acidic fluoride media: formation ratio of oxide layers from electrochemical impedance spectroscopy [J].
Frateur, I ;
Cattarin, S ;
Musiani, M ;
Tribollet, B .
JOURNAL OF ELECTROANALYTICAL CHEMISTRY, 2000, 482 (02) :202-210
[9]   Electropolishing of NiTi shape memory alloys in methanolic H2SO4 [J].
Fushimi, Koji ;
Stratmann, Martin ;
Hassel, Achim Walter .
ELECTROCHIMICA ACTA, 2006, 52 (03) :1290-1295
[10]   ELECTROCHEMICAL-BEHAVIOR OF PASSIVE IRON IN ACID-MEDIUM .1. IMPEDANCE APPROACH [J].
KEDDAM, M ;
LIZEE, JF ;
PALLOTTA, C ;
TAKENOUTI, H .
JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1984, 131 (09) :2016-2024