Two-Dimensional Fast Fourier Transform Analysis of Surface Microstructures of Thin Aluminium Films Prepared by Radio-Frequency (RF) Magnetron Sputtering

被引:1
作者
Mwema, Fredrick M. [1 ]
Akinlabi, Esther T. [1 ]
Oladijo, Oluseyi P. [1 ,2 ]
机构
[1] Univ Johannesburg, Dept Mech Engn Sci, Auckland Pk Campus, ZA-2006 Johannesburg, South Africa
[2] Botswana Int Sci & Technol, Dept Chem Mat & Met Engn, Private Bag 16, Palapye, Botswana
来源
ADVANCES IN MATERIAL SCIENCES AND ENGINEERING | 2020年
关键词
Atomic force microscopy (AFM); Aluminium thin films; Image analysis; Fast Fourier transform (FFT); Field emission electron microscopy; (FESEM); Sputtering;
D O I
10.1007/978-981-13-8297-0_27
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
The purpose of this article is to illustrate the use of two-dimensional fast Fourier transform (2D-FFT) algorithm to describe the properties of aluminium thin films. To do so, the microstructures of thin Al films deposited on stainless steel substrates though radio-frequency (RF) magnetron sputtering are analysed using twodimensional fast Fourier transform (2D-FFT) algorithm. Field emission scanning electronmicroscope (FESEM) and atomic forcemicroscope (AFM) images obtained on the surfaces of the films are taken through different image analysis processes. The power spectra are described in terms of spatial frequencies, wavelengths and light intensities in the reciprocal space for both SEM and AFM images. The results of power spectra obtained from FESEM and AFM micrographs are compared for two different cases-films deposited at 200 and 300 W at the same substrate temperature (100 degrees C). We observe that the 2D-FFT analysis of both SEM and AFM methods can describe (in more details) the distribution of surface structures in thin aluminium films.
引用
收藏
页码:239 / 249
页数:11
相关论文
共 11 条
[1]   Deposition and characterization of molybdenum thin film using direct current magnetron and atomic force microscopy [J].
Aqil, Muhtade Mustafa ;
Azam, Mohd Asyadi ;
Aziz, Mohd Faizal ;
Latif, Rhonira .
Journal of Nanotechnology, 2017, 2017
[2]  
Cao Y, 2007, 1 INT C INT COMM MIC, P1181
[3]   Properties of physically deposited thin aluminium film coatings: A review [J].
Mwema, F. M. ;
Oladijo, O. P. ;
Akinlabi, S. A. ;
Akinlabi, E. T. .
JOURNAL OF ALLOYS AND COMPOUNDS, 2018, 747 :306-323
[4]  
Mwema FM, 2018, MATER RES EXPRESS, V5, P1
[5]  
Mwema FM, 2018, MATER TODAY, V5, P20473
[6]   Microstructural evolution during film growth [J].
Petrov, I ;
Barna, PB ;
Hultman, L ;
Greene, JE .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A, 2003, 21 (05) :S117-S128
[7]  
Simon AH, 2018, HANDBOOK OF THIN FILM DEPOSITION, 4TH EDITION, P195, DOI 10.1016/B978-0-12-812311-9.00007-4
[8]   Topographic characterization of thin film field-effect transistors of 2,6-diphenyl anthracene (DPA) by fractal and AFM analysis [J].
Talu, Stefan ;
Bramowicz, Miroslaw ;
Kulesza, Slawomir ;
Solaymani, Shahram .
MATERIALS SCIENCE IN SEMICONDUCTOR PROCESSING, 2018, 79 :144-152
[9]   Magnetron Sputtering Yield and Relative Factors [J].
Wang, Lifeng ;
Wu, Zeyan ;
Meng, Zhijun .
NATURAL RESOURCES AND SUSTAINABLE DEVELOPMENT, PTS 1-3, 2012, 361-363 :1655-+
[10]  
Wasa K., 1992, Handbook of Sputter Deposition Technology