Microstructure and magnetic properties of Ti/Ni/Ti in dependence on Ni layer thickness

被引：2

作者：

Zhang Hanwei ^{[1
]}

Feng Shunzhen ^{[1
]}

Zhang Yujie ^{[1
]}

Sun Huiyuan ^{[1
]}

机构：

[1] Hebei Normal Univ, Coll Phys Sci & Informat Engn, Shijiazhuang 050016, Peoples R China

来源：

RARE METALS | 2006年 / 25卷

基金：

中国国家自然科学基金;

关键词：

magnetic recording; magnetron sputtering; coercivity; annealing;

D O I：

10.1016/S1001-0521(07)60152-1

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

The films of Ti(15 nm)/Ni (t nm) /Ti (15 nm) (t = 20, 30, 40, 50) were prepared by do magnetron sputtering at room temperature and subsequent annealing at 400 degrees C for 30 min. Scanning probe microscope (SPM), vibrating sample magnetometer (VSM) and X-ray diffraction (XRD) were applied to study the magnetic properties and microstructure. AFM images show that small and uniform grains and some clusters appear with the increase of Ni thickness, also MFM images show that the size of domain first decreases and then increases. The coercivity reaches the maximum 48 kA center dot m(-1) at t = 30 nm. The XRD profiles show stronger fcc (111) orientation peak of Ni and weak hcp structure peaks of Ni3Ti. This results reveal that the crystal lines have the prefer orientation and achieve the ordered.

引用

页码：592 / 595

页数：4

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