Immersion patterning down to 27 nm half pitch

被引：8

作者：

Bloomstein, T. M. ^{[1
]}

Fedynyshyn, T. H. ^{[1
]}

Pottebaum, I. ^{[1
]}

Marchant, M. F. ^{[1
]}

Deneault, S. J. ^{[1
]}

Rothschild, M. ^{[1
]}

机构：

[1] MIT, Lincoln Lab, Lexington, MA 02420 USA

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 2006年 / 24卷 / 06期

关键词：

D O I：

10.1116/1.2366678

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

Liquid immersion interference lithography at 157 nm has been used to print gratings of 27 nm half pitch with a fluorine-doped fused silica prism having index of 1.66. In order to achieve these dimensions, new immersion fluids have been designed and synthesized. These are partially fluorinated organosiloxanes with indexes up to 1.5. Their absorbance is on the order of 0.4/mu m (base 10), enabling the use of liquid films with micron-size thickness. To utilize these serniabsorptive fluids, an immersion interference printer has been designed, built, and implemented for handling micron-scale liquid layers. (c) 2006 American Vacuum Society.

引用

页码：2789 / 2797

页数：9

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