Wide band frequency and in situ characterisation of high permittivity insulators (High-K) for HF integrated passives

被引:14
作者
Lacrevaz, T.
Flechet, B.
Farcy, A.
Torres, J.
Gros-Jean, M.
Bermond, C.
Vo, T. T.
Cueto, O.
Blampey, B.
Angenieux, G.
Piquet, J.
de Crecy, F.
机构
[1] Univ Savoie, LAHC, F-73376 Le Bourget du Lac, France
[2] STMicroelect, F-38926 Crolles, France
[3] CEA, LETI, Technol Avancees, F-38054 Grenoble, France
关键词
permittivity; High-K; dielectrics; characterization; high frequency; coplanar wave guide;
D O I
10.1016/j.mee.2006.10.030
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
High permittivity insulators (High-K) are progressively introduced in high-speed integrated passives and devices in order to optimize circuits performances. However, High-K properties are expected to vary with manufacturing process and also frequency as relaxation and resonance mechanisms occur. It is necessary to analyze and evaluate High-K behaviour from DC to microwave frequency. Real permittivity (K or epsilon'(r)) and losses (epsilon"(r)) assessment is required over a wide band of frequency to select the most suitable insulator. The proposed method enables the characterization of as deposited thin (down to 60 nm) planar dielectrics integrated below a copper coplanar wave-guide up to 40 GHz. Results of Si3N4, Ta2O5 and STO insulators are presented in this paper. (c) 2006 Elsevier B.V. All rights reserved.
引用
收藏
页码:2184 / 2188
页数:5
相关论文
共 6 条
  • [1] CHEN AB, 2002, IEEE MTTS 2002 SEATT
  • [2] Robert P., 1988, ELECT MAGNETIC PROPE
  • [3] ROTONDARO A, 2002, VLSI 2002 HON JUN
  • [4] Schiek B., 1996, DEV AUTOMATIC NETWOR
  • [5] YU MB, 2005, IEEE ELECT DEVICE LE, V26
  • [6] AGILENT NETWORK ANAL