Effect of magnetic annealing on the τ-phase of MnAl thin films

被引：19

作者：

Fischer, GA ^{[1
]}

Rudee, ML ^{[1
]}

机构：

[1] Univ Calif San Diego, Ctr Magnet Recording Res, Grad Program Mat Sci, La Jolla, CA 92093 USA

来源：

JOURNAL OF MAGNETISM AND MAGNETIC MATERIALS | 2000年 / 213卷 / 03期

基金：

美国国家科学基金会;

关键词：

thin films tau-phase; magnetic annealing;

D O I：

10.1016/S0304-8853(00)00007-X

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

The effect of magnetic field annealing on the metastable tau-phase of MnAl films produced by DC sputtering has been investigated. As deposited films were nearly amorphous. Post-deposition annealing of films produced significant amounts of tau-phase in the thickness range of 2000-5000 Angstrom. Post-deposition annealing in a magnetic field increased values of M-S, in some cases by up to 5 x, as compared to samples annealed in zero field, (C) 2000 Elsevier Science B.V. AII rights reserved.

引用

页码：335 / 339

页数：5

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