Effect of oxygen on the thermomechanical behavior of tantalum thin films during the β-α phase transformation

被引:48
作者
Knepper, Robert [1 ]
Stevens, Blake [1 ]
Baker, Shefford P. [1 ]
机构
[1] Cornell Univ, Dept Mat Sci & Engn, Ithaca, NY 14853 USA
基金
美国国家科学基金会;
关键词
D O I
10.1063/1.2388742
中图分类号
O59 [应用物理学];
学科分类号
摘要
Tantalum thin films were prepared in the metastable beta phase, and their thermomechanical behaviors were investigated in situ in an ultrahigh vacuum environment. Controlled levels of oxygen were incorporated into the films either during deposition, by surface oxidation after deposition, or during thermomechanical testing. The transformation from the beta phase to the stable alpha phase takes place in conjunction with a distinct increase in tensile stress. The thermomechanical behavior is strongly affected by the amount of oxygen to which the film is exposed and the method of exposure. Increasing oxygen content inhibits the phase transformation, requiring higher temperatures to reach completion. It is shown that the phase transformation takes place by a nucleation and growth process that is limited by growth. Changes in the activation energy for the phase transformation due to solute drag are estimated as a function of oxygen content and the mechanisms behind the stress evolution are elucidated. (c) 2006 American Institute of Physics.
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页数:11
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