Hybrid modelling of low temperature plasmas for fundamental investigations and equipment design

被引:303
作者
Kushner, Mark J. [1 ]
机构
[1] Univ Michigan, Dept Elect Engn & Comp Sci, Ann Arbor, MI 48109 USA
关键词
PHYSICAL VAPOR-DEPOSITION; INDUCTIVELY-COUPLED PLASMAS; PROCESSING REACTORS; SILICON DIOXIDE; DISCHARGES; SIO2; AR; SIMULATIONS; PROPAGATION; PARTICLE;
D O I
10.1088/0022-3727/42/19/194013
中图分类号
O59 [应用物理学];
学科分类号
摘要
The modelling of low temperature plasmas for fundamental investigations and equipment design is challenged by conflicting goals-having detailed, specialized algorithms which address sometimes subtle physical phenomena while also being flexible enough to address a wide range of process conditions. Hybrid modelling (HM) is a technique which provides many opportunities to address both fundamental physics and practical matters of equipment design. HM is a hierarchical approach in which modules addressing different physical processes on vastly disparate timescales are iteratively combined using time-slicing techniques. By compartmentalizing the physics in each module to accept given inputs and produce required outputs, different algorithms can be used to represent the same physical processes. In this manner, the algorithms best suited for the conditions of interest can be used without affecting other modules. In this paper, the basis and implementation of HM are discussed using examples from simulations of inductively coupled plasmas.
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页数:20
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