Directed self-assembly of solvent-vapor-induced non-bulk block copolymer morphologies on nanopatterned substrates

被引：22

作者：

Wan, Lei ^{[1
]}

Ji, Shengxiang ^{[2
]}

Liu, Chi-Chun ^{[3
]}

Craig, Gordon S. W. ^{[4
]}

Nealey, Paul F. ^{[4
]}

机构：

[1] HGST, San Jose Res Ctr, 3403 Yerba Buena Rd, San Jose, CA 95135 USA

[2] Chinese Acad Sci, Changchun Inst Appl Chem, Key Lab Polymer Ecomat, 5625 Renmin St, Changchun 130022, Peoples R China

[3] IBM Albany NanoTech, 257 Fuller Rd, Albany, NY 12203 USA

[4] Univ Chicago, Inst Mol Engn, 5747 South Ellis Ave, Chicago, IL 60637 USA

来源：

SOFT MATTER | 2016年 / 12卷 / 11期

基金：

中国国家自然科学基金;

关键词：

THIN-FILMS; DENSITY MULTIPLICATION; AREAL DENSITY; FABRICATION; NANOSTRUCTURES; GRAPHOEPITAXY; LITHOGRAPHY; NANOLITHOGRAPHY; PATTERNS; BLENDS;

D O I：

10.1039/c5sm02829a

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

We report a study on directed self-assembly (DSA) with solvent annealing to induce the formation of non-bulk block copolymer microdomains on chemical patterns. Ultrathin films of symmetric polystyrene-block-poly(methyl methacrylate) (PS-b-PMMA) display morphologies of PMMA dots, stripes, and PS hexagons with increasing exposure time to acetone vapor, a PMMA-selective solvent. All three nanostructures form long-range-ordered and registered arrays on striped chemical patterns with periods (L-S) commensurate to the solvated PS-b-PMMA microdomain period (L-0,L-s). Solvent annealing is shown to facilitate DSA on non-regular chemical patterns, on which the local periods are incommensurate to L0, s. DSA with feature density multiplication, via solvent annealing, is also demonstrated.

引用

页码：2914 / 2922

页数：9

共 63 条

[1] Bit-Patterned Magnetic Recording: Theory, Media Fabrication, and Recording Performance [J].

Albrecht, Thomas R. ;

Arora, Hitesh ;

Ayanoor-Vitikkate, Vipin ;

Beaujour, Jean-Marc ;

Bedau, Daniel ;

Berman, David ;

Bogdanov, Alexei L. ;

Chapuis, Yves-Andre ;

Cushen, Julia ;

Dobisz, Elizabeth E. ;

Doerk, Gregory ;

Gao, He ;

Grobis, Michael ;

Gurney, Bruce ;

Hanson, Weldon ;

Hellwig, Olav ;

Hirano, Toshiki ;

Jubert, Pierre-Olivier ;

Kercher, Dan ;

Lille, Jeffrey ;

Liu, Zuwei ;

Mate, C. Mathew ;

Obukhov, Yuri ;

Patel, Kanaiyalal C. ;

Rubin, Kurt ;

Ruiz, Ricardo ;

Schabes, Manfred ;

Wan, Lei ;

Weller, Dieter ;

Wu, Tsai-Wei ;

Yang, En .

IEEE TRANSACTIONS ON MAGNETICS, 2015, 51 (05)

[2] Block Copolymer Nanolithography: Translation of Molecular Level Control to Nanoscale Patterns [J].

Bang, Joona ;

Jeong, Unyong ;

Ryu, Du Yeol ;

Russell, Thomas P. ;

Hawker, Craig J. .

ADVANCED MATERIALS, 2009, 21 (47) :4769-4792

[3] BLOCK COPOLYMER THERMODYNAMICS - THEORY AND EXPERIMENT [J].

BATES, FS ;

FREDRICKSON, GH .

ANNUAL REVIEW OF PHYSICAL CHEMISTRY, 1990, 41 (01) :525-557

[4] Self-Assembly Patterning for sub-15nm Half-Pitch: A Transition from Lab to Fab [J].

Bencher, Chris ;

Smith, Jeffrey ;

Miao, Liyan ;

Cai, Cathy ;

Chen, Yongmei ;

Cheng, Joy Y. ;

Sanders, Daniel P. ;

Tjio, Melia ;

Truong, Hoa D. ;

Holmes, Steven ;

Hinsberg, William D. .

ALTERNATIVE LITHOGRAPHIC TECHNOLOGIES III, 2011, 7970

[5] Graphoepitaxy of self-assembled block copolymers on two-dimensional periodic patterned templates [J].

Bita, Ion ;

Yang, Joel K. W. ;

Jung, Yeon Sik ;

Ross, Caroline A. ;

Thomas, Edwin L. ;

Berggren, Karl K. .

SCIENCE, 2008, 321 (5891) :939-943

[6] Polymer self assembly in semiconductor microelectronics [J].

Black, C. T. ;

Ruiz, R. ;

Breyta, G. ;

Cheng, J. Y. ;

Colburn, M. E. ;

Guarini, K. W. ;

Kim, H.-C. ;

Zhang, Y. .

IBM JOURNAL OF RESEARCH AND DEVELOPMENT, 2007, 51 (05) :605-633

[7] Control of self-assembly of lithographically patternable block copolymer films [J].

Bosworth, Joan K. ;

Paik, Marvin Y. ;

Ruiz, Ricardo ;

Schwartz, Evan L. ;

Huang, Jenny Q. ;

Ko, Albert W. ;

Smilgies, Detlef-M. ;

Black, Charles T. ;

Ober, Christopher K. .

ACS NANO, 2008, 2 (07) :1396-1402

[8] 20 nm Pitch Directed Block Copolymer Assembly Using Solvent Annealing for Bit Patterned Media [J].

Bosworth, Joan K. ;

Dobisz, Elizabeth ;

ruiz, Ricardo .

JOURNAL OF PHOTOPOLYMER SCIENCE AND TECHNOLOGY, 2010, 23 (02) :145-148

[9] Widely Tunable Morphologies in Block Copolymer Thin Films Through Solvent Vapor Annealing Using Mixtures of Selective Solvents [J].

Chavis, Michelle A. ;

Smilgies, Detlef-M. ;

Wiesner, Ulrich B. ;

Ober, Christopher K. .

ADVANCED FUNCTIONAL MATERIALS, 2015, 25 (20) :3057-3065

[10] Dense self-assembly on sparse chemical patterns: Rectifying and multiplying lithographic patterns using block copolymers [J].

Cheng, Joy Y. ;

Rettner, Charles T. ;

Sanders, Daniel P. ;

Kim, Ho-Cheol ;

Hinsberg, William D. .

ADVANCED MATERIALS, 2008, 20 (16) :3155-3158

← 1 2 3 4 5 6 7 →