Time-resolved three-dimensional microscopy of laser photothermal imaging processes

被引：0
|
作者：
Koulikov, SG [1 ]
Dlott, DD [1 ]
机构：
[1] Univ Illinois, Dept Chem, Urbana, IL USA
来源：
IS&T'S NIP14: INTERNATIONAL CONFERENCE ON DIGITAL PRINTING TECHNOLOGIES, PROCEEDINGS | 1998年
关键词：
D O I：
暂无
中图分类号：
TP3 [计算技术、计算机技术];
学科分类号：
0812 ;
摘要：
Fundamental mechanisms of exposure by near-infrared (IR) laser pulses, of multilayer laser photothermal imaging media used as offset lithographic printing plates in computer-to-press or computer-to-plate applications, are investigated with time-resolved three-dimensional optical microscopy, with imaging pulses in the 1-ns to 10-mu s range. Different behavior of different layers was observed depending on the pulse duration and pulse energy.
引用
收藏
页码：172 / 175
页数：4
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