共 18 条
- [1] Combining microstereolithography and thick resist UV lithography for 3D microfabrication [J]. MICRO ELECTRO MECHANICAL SYSTEMS - IEEE ELEVENTH ANNUAL INTERNATIONAL WORKSHOP PROCEEDINGS, 1998, : 18 - 23
- [2] CHEN MJ, 1998, THESIS U MASSACHUSET
- [4] High-aspect-ratio, ultrathick, negative-tone near-UV photoresist for MEMS applications [J]. MEMS 97, PROCEEDINGS - IEEE THE TENTH ANNUAL INTERNATIONAL WORKSHOP ON MICRO ELECTRO MECHANICAL SYSTEMS: AN INVESTIGATION OF MICRO STRUCTURES, SENSORS, ACTUATORS, MACHINES AND ROBOTS, 1997, : 518 - 522
- [5] EYRE B, 1995, 11 IEEE MICR EL MECH, P218
- [6] FARRIS RJ, 1964, J APPL POLYM SCI, V8, P25
- [7] FENG R, 2002, IN PRESS J APPL POLY
- [8] FENG R, 2002, UNPUB J MICROMECH MI
- [9] LABIANCA N, 1993, ELEC SOC P V, V9518, P386
- [10] LAI WM, 1996, INTRO CONTINUUM MECH