Temperature dependence of nucleation and growth of nanoparticles in low pressure Ar/CH4 RF discharges

被引:36
作者
Beckers, J. [1 ]
Stoffels, W. W. [1 ]
Kroesen, G. M. W. [1 ]
机构
[1] Eindhoven Univ Technol, Dept Appl Phys, NL-5600 MB Eindhoven, Netherlands
关键词
DUST PARTICLE FORMATION; PLASMAS; AR/C2H2;
D O I
10.1088/0022-3727/42/15/155206
中图分类号
O59 [应用物理学];
学科分类号
摘要
The gas temperature (T-g) dependence of nucleation and growth processes of hydrocarbon nanoparticles in low pressure Ar/CH4 RF discharges has been investigated. Measuring the electron density with the microwave cavity resonance technique allowed us to monitor nucleation processes on small (mu s) time scales. On larger time scales, coagulation times and growth rates are determined by means of measuring the phase angle between the RF voltage and current in correlation with laser light scattering. The experimental results show a significant gas temperature dependence of both powder nucleation and growth processes. Within the measured gas temperature range (20-130 degrees C) the particle growth rate decreases by a factor of similar to 3.7, while the coagulation time increases by a factor of similar to 6.5 with increasing T-g. Moreover, in this paper we present a simplified model which uses the experimentally determined growth rates and coagulation times to predict the value of the critical density of nanometre sized neutral particles, necessary to initiate coagulation. This model estimates a critical density of 3.5 x 10(15) m(-3) at room temperature which decreases with increasing temperature.
引用
收藏
页数:10
相关论文
共 21 条
[1]  
[Anonymous], THESIS EINDHOVEN U T
[2]  
[Anonymous], THESIS EINDHOVEN U T
[3]   Dust particle formation in low pressure Ar/CH4 and Ar/C2H2 discharges used for thin film deposition [J].
Berndt, J ;
Hong, S ;
Kovacevic, E ;
Stefanovic, I ;
Winter, J .
VACUUM, 2003, 71 (03) :377-390
[4]   Numerical study of the effect of gas temperature on the time for onset of particle nucleation in argon-silane low-pressure plasmas [J].
Bhandarkar, U ;
Kortshagen, U ;
Girshick, SL .
JOURNAL OF PHYSICS D-APPLIED PHYSICS, 2003, 36 (12) :1399-1408
[5]  
Bouchoule Andre, 1999, Dusty plasmas: physics, chemistry, and technological impacts in plasma processing
[6]   STUDY OF INITIAL DUST FORMATION IN AN AR-SIH4 DISCHARGE BY LASER-INDUCED PARTICLE EXPLOSIVE EVAPORATION [J].
BOUFENDI, L ;
HERMANN, J ;
BOUCHOULE, A ;
DUBREUIL, B ;
STOFFELS, E ;
STOFFELS, WW ;
DEGIORGI, ML .
JOURNAL OF APPLIED PHYSICS, 1994, 76 (01) :148-153
[7]   Electrical characterization and modeling of a dust forming plasma in a radio frequency discharge [J].
Boufendi, L ;
Bouchoule, A ;
Hbid, T .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1996, 14 (02) :572-576
[8]   Numerical investigation of particle formation mechanisms in silane discharges [J].
De Bleecker, K ;
Bogaerts, A ;
Gijbels, R ;
Goedheer, W .
PHYSICAL REVIEW E, 2004, 69 (05) :16
[9]   Ion molecule and dust particle formation in Ar/CH4, Ar/C2H2 and Ar/C3H6 radio-frequency plasmas [J].
Do, HT ;
Thieme, G ;
Fröhlich, M ;
Kersten, H ;
Hippler, R .
CONTRIBUTIONS TO PLASMA PHYSICS, 2005, 45 (5-6) :378-384
[10]   Tracking the organic refractory component from interstellar dust to comets [J].
Greenberg, JM ;
Li, AG .
LIFE SCIENCES: NEW INSIGHTS INTO COMPLEX ORGANICS IN SPACE, 1999, 24 (04) :497-504