Dose dependence of radiation damage in nano-structured amorphous SiOC/crystalline Fe composite

被引：22

作者：

Su, Qing ^{[1
]}

Price, Lloyd ^{[2
]}

Shao, Lin ^{[2
]}

Nastasi, Michael ^{[1
,3
,4
]}

机构：

[1] Univ Nebraska, Nebraska Ctr Energy Sci Res, Lincoln, NE 68583 USA

[2] Texas A&M Univ, Dept Nucl Engn, College Stn, TX 77843 USA

[3] Univ Nebraska, Dept Mech & Mat Engn, Lincoln, NE 68583 USA

[4] Univ Nebraska, Nebraska Ctr Mat & Nanosci, Lincoln, NE 68583 USA

来源：

MATERIALS RESEARCH LETTERS | 2016年 / 4卷 / 01期

关键词：

Radiation-Tolerant Materials; Amorphous SiOC; Nanocrystalline Fe; Interface; ION IRRADIATION; GRAIN-BOUNDARIES; PURE IRON; HELIUM; ALLOYS; TOLERANCE; HE;

D O I：

10.1080/21663831.2015.1103796

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

Through examination of radiation tolerance properties of amorphous silicon oxycarbide (SiOC) and crystalline Fe composite to averaged damage levels, from approximately 8 to 30 displacements per atom (dpa), we demonstrated that the Fe/SiOC interface and the Fe/amorphous FexSiyOz interface act as efficient defect sinks and promote the recombination of vacancies and interstitials. For thick Fe/SiOC multilayers, a clear Fe/SiOC interface remained and no irradiation-induced mixing was observed even after 32 dpa. For thin Fe/SiOC multilayers, an amorphous FexSiyOz intermixed layer was observed to form at 8 dpa, but no further layer growth was observed for higher dpa levels. [GRAPHICS] .

引用

页码：48 / 54

页数：7

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