Manufacture, microstructure and mechanical properties of Mo-W-N nanostructured hard films

被引:26
|
作者
Yang, J. F. [1 ]
Yuan, Z. G. [1 ]
Zhang, G. G. [2 ]
Wang, X. P. [1 ]
Fang, Q. F. [1 ,2 ]
机构
[1] Chinese Acad Sci, Key Lab Mat Phys, Inst Solid State Phys, Hefei 230031, Peoples R China
[2] Nanchang Hangkong Univ, Dept Mat Sci & Engn, Nanchang 330034, Peoples R China
基金
中国国家自然科学基金;
关键词
Nitrides; Thin films; Sputtering; X-ray diffraction; Mechanical properties; TUNGSTEN NITRIDE COATINGS; WNX FILMS; DEPOSITION; TEMPERATURE; PRESSURE; BEHAVIOR; TEXTURE; GROWTH; CRN; TIN;
D O I
10.1016/j.materresbull.2009.06.013
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Mo1-xWxNy (x = 0-0.67) hard films were fabricated on wafers of silicon and high speed steel by dc magnetron sputtering technique. The effect of tungsten concentration on the phase composition, microstructure, surface morphology, hardness, adhesion, and corrosion resistance of the films was studied by X-ray diffraction, scanning electron microscopy, nano-indentation, and scratch test. It was found that if the W concentration (x) in the film is in the range of 0-0.52, the films exhibit fcc (Mo,W)N-y single phase where larger W atoms substituted Mo atoms in fcc MoNy. At higher x values (x > 0.52) the films exhibit a two-phase structure consisting of fcc (Mo,W)N-y and pure bcc tungsten phase. The hardness of the Mo1-xWxNy films increases at first with increasing x, and then decreases after passing a maximum. The maximum hardness of 47 GPa is obtained at x = 0.37 corresponding to an adhesion strength of 60 N. The Mo-W-N coated high speed steel has a lower corrosion current density and higher corrosion potential than the bare high speed steel substrates. (C) 2009 Elsevier Ltd. All rights reserved.
引用
收藏
页码:1948 / 1953
页数:6
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