Near-field nonlinear imaging of an anapole mode beyond diffraction limit

被引：2

作者：

Cui, Tong ^{[1
]}

Zhang, Mingqian ^{[2
]}

Zhao, Yun ^{[1
]}

Yang, Yuanmu ^{[1
]}

Bai, Benfeng ^{[1
]}

Sun, Hong-Bo ^{[1
]}

机构：

[1] Tsinghua Univ, Dept Precis Instrument, State Key Lab Precis Measurement Technol & Instru, Beijing 100084, Peoples R China

[2] China Acad Space Technol, Qian Xuesen Lab Space Technol, Beijing 100094, Peoples R China

来源：

OPTICS LETTERS | 2021年 / 46卷 / 09期

基金：

中国国家自然科学基金;

关键词：

3RD HARMONIC-GENERATION; 2ND-HARMONIC GENERATION; OPTICAL MICROSCOPY; ORDER;

D O I：

10.1364/OL.418664

中图分类号：

O43 [光学];

学科分类号：

070207 ; 0803 ;

摘要：

Nonlinear nanophotonics, as an emerging field in nanophotonics, eagerly calls for experimental techniques for probing and analyzing near-field nonlinear optical signals with subwavelength resolution. Here, we report an aperture-type scanning near-field optical microscopic method for probing near-field nonlinear optical processes. As a demonstration, near-field third-harmonic generation from an anapole dark-mode state generated by a silicon nanodisk is probed and imaged. The measured results agree well with the simulations, with a spatial resolution down to 0.14 lambda(0) and a sensitivity of 0.1 nW. This method provides a powerful tool for characterizing nonlinear light-matter interactions at the nanoscale, which can help, for example, to unveil crystal properties involving subwavelength defects or dislocations. (C) 2021 Optical Society of America

引用

页码：2095 / 2098

页数：4

共 29 条

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