High-Delta n silica-on-silicon channel waveguides based on sol-gel germanophosphosilicate glass

被引：16
|
作者：
Syms, RRA
Schneider, VM
Huang, W
Ahmad, MM
机构：
[1] Dept. of Elec. and Electron. Eng., Imperial College, London SW7, Exhibition Road
来源：
ELECTRONICS LETTERS | 1997年 / 33卷 / 14期
关键词：
optical waveguides; sol-gel processing;
D O I：
10.1049/el:19970851
中图分类号：
TM [电工技术]; TN [电子技术、通信技术];
学科分类号：
0808 ; 0809 ;
摘要：
A process for fabrication of high-Delta n silica-on-silicon channel waveguides by spin-coating and rapid thermal annealing of sol-gel germanophosilicate glass is described. A recipe for the preparation of stable sols and a parameter range for deposition of crack-free films are given. Low and spectrally flat insertion loss is demonstrated for singlemode guides with a Delta n of 1.5 x 10(-2).
引用
收藏
页码：1216 / 1217
页数：2
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