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Interface thermal conductance in silicene and stanene monolayer: A molecular dynamics study
被引:5
作者:
Wu, Jiaxin
[1
]
Wen, Hao
[1
]
Shi, Hongzhen
[1
]
Chen, Changpeng
[1
,2
]
Huang, Bin
[1
]
Wei, Yufan
[3
]
Li, Min
[4
]
机构:
[1] Wuhan Univ Technol, Sch Sci, Wuhan 430070, Hubei, Peoples R China
[2] Wuhan Univ Technol, Res Ctr Mat Genome Engn, Wuhan 430070, Hubei, Peoples R China
[3] Dalian Univ Technol, Sch Sci, Dalian 124000, Peoples R China
[4] China Agr Univ, Sch Sci, Beijing 100000, Peoples R China
基金:
中国国家自然科学基金;
关键词:
Thermal conductance;
Silicene;
Stanene;
Molecular dynamics;
TRANSPORT;
GRAPHENE;
CONDUCTIVITY;
TRANSISTORS;
D O I:
10.1016/j.spmi.2019.04.025
中图分类号:
O469 [凝聚态物理学];
学科分类号:
070205 ;
摘要:
In this study, we have performed non-equilibrium molecular dynamics simulation (NEMD) to the interface thermal transport in silicene/stanene hetero-structures, which include the effect of structure size, temperature and defects on the thermal conductance G. The results show that G increases with the temperature significantly, while almost keep constant with the variable of the size of structure. The vacancy defects will lead to the decrease of saturated thermal conductance compared with the defect-free one, which is ascribed to the enhancement of phonon inversion process and the scattering concentration of the phonons. In particular, a singularity point of thermal conductance is found when a single vacancy defect is set in the interface of stanene with the vacancy defect moving. Our result indicates that the thermal conductance of silicene/stanene hetero-structures present remarkable properties (low size dependence and singularities exist as defects move) and are promising for applications of the low dimensional silicene/stanene nanostructure based thermal and nanoelectronic devices.
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页码:258 / 266
页数:9
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