A magnetron sputtering device with generation of pulsed beams of high-energy gas atoms

被引：5

作者：

Metel, A. S. ^{[1
]}

Grigoriev, S. N. ^{[1
]}

Volosova, M. A. ^{[1
]}

Melnik, Yu. A. ^{[1
]}

机构：

[1] Moscow State Univ Technol STANKIN, Moscow 127994, Russia

来源：

INSTRUMENTS AND EXPERIMENTAL TECHNIQUES | 2017年 / 60卷 / 02期

关键词：

ION-IMPLANTATION; ELECTROSTATIC CONFINEMENT; GLOW-DISCHARGE; DEPOSITION; MOLECULES; COATINGS; PRESSURE; ELECTRONS; PLASMA;

D O I：

10.1134/S0020441217020117

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

Coating deposition study results are presented a source of joint flow of metal atoms and highenergy gas atoms being used for the deposition. Metal atoms are produced due to sputtering of a flat rectangular target in magnetron discharge. Gas atoms with energies up to 30 keV are produced due to both the acceleration of ions from discharge plasma by high-voltage pulses applied to a grid that is parallel to the target, and ion charge exchange in space-charge sheaths near the grid surface. Metal atoms pass through the grid and are deposited on articles. The coincidence of their trajectories with those of gas atoms that bombard the growing coating allows coatings to be synthesized on dielectric articles that rotate in a chamber. High-energy gas atoms mix the atoms of the coating with the atoms of the article material in its surface layer, thus improving the coating adhesion.

引用

页码：290 / 296

页数：7

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