Characterization of the quality of ZnO thin films using reflective second harmonic generation

被引：16

作者：

Huang, Yi-Jen ^{[2
]}

Lo, Kuang-Yao ^{[1
]}

Liu, Chung-Wei ^{[1
]}

Liu, Chun-Chu ^{[1
]}

Chu, Sheng-Yuan ^{[2
]}

机构：

[1] Natl Chia Yi Univ, Dept Appl Phys, Chiayi 600, Taiwan

[2] Natl Cheng Kung Univ, Dept Elect Engn, Tainan 700, Taiwan

来源：

APPLIED PHYSICS LETTERS | 2009年 / 95卷 / 09期

关键词：

ZINC-OXIDE; PHOTOLUMINESCENCE; GROWTH; MOCVD;

D O I：

10.1063/1.3216848

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

A polar mirror symmetrical contribution originated from the arrangement of grain boundaries existing in the ZnO film is detected by reflective second harmonic generation pattern. The ordering of ZnO grain boundary is dependent on the kinetic energy of deposited atoms and affects the quality of ZnO films. The net direction of the grain boundary in ZnO film trends toward the [(1) over bar 10] direction of Si(111) to reach the minimum grain energy for better quality ZnO film. The polar structure of the mirrorlike boundaries under the optically macroscopic viewpoint presents a correlation with film quality. (C) 2009 American Institute of Physics. [DOI: 10.1063/1.3216848]

引用

页数：3

共 22 条

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