Thermolysis of polymethacrylates for 193 nm resist

被引：3
|
作者：
Ogata, Toshiyuki
Kasai, Kohei
Matsumaru, Shogo
Takahashi, Motoki
Hada, Hideo
Shirai, Masamitsu
机构：
[1] Tokyo Ohka Kogyo Co Ltd, Kanagawa 2530114, Japan
[2] Osaka Prefecture Univ, Grad Sch Engn, Dept Appl Chem, Osaka 5998531, Japan
来源：
JOURNAL OF PHOTOPOLYMER SCIENCE AND TECHNOLOGY | 2006年 / 19卷 / 06期
关键词：
193 nm resist; thermal degradation; thermal desorption spectroscopy;
D O I：
10.2494/photopolymer.19.705
中图分类号：
O63 [高分子化学（高聚物）];
学科分类号：
070305 ; 080501 ; 081704 ;
摘要：
[No abstract available]
引用
收藏
页码：705 / 708
页数：4
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