AlN/SiC MEMS for High-Temperature Applications

被引:20
作者
Esteves, Giovanni [1 ]
Habermehl, Scott D. [1 ]
Clews, Peggy J. [1 ]
Fritch, Chanju [1 ]
Griffin, Benjamin A. [1 ]
机构
[1] Sandia Natl Labs, Albuquerque, NM 87123 USA
关键词
Extreme environment; piezoelectric film; piezoelectric micromachined ultrasound transducers (PMUT); microresonators; aluminum nitride; silicon carbide; ELASTIC PROPERTIES; NITRIDE FILMS; OXIDATION; FREQUENCY;
D O I
10.1109/JMEMS.2019.2923919
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
The creation of microelectromechanical systems (MEMS) that can operate through elevated temperatures would enable systems diagnostics and controls that are not possible with conventional-off-the-shelf components. The integration of silicon carbide (SiC) with aluminum nitride (AlN) has led to the fabrication of devices that can withstand elevated temperature anneals >935 degrees C. The results from a piezoelectric micromachined ultrasonic transducer (PMUT) and a microresonator are reported as demonstrations of the fabrication process. Testing the PMUT response before and after annealing at 935 degrees C led to a change in resonant frequency of less than 1%, which is attributable to a shift in film stress. The response of the microresonator was RF tested in situ up to 500 degrees C and showed no degradation in its electromechanical coupling coefficient. The resonant frequency decreased with temperature due to the temperature coefficient of Young's modulus, and the quality factor decreased with temperature and remained unrecoverable upon cooling. The degradation in the quality factor is suspected to be a result of oxidation of the titatium nitride (TiN) top electrode, which increases the resistivity and leads to an unrecoverable reduction in the quality factor. The robust piezoelectric response of AlN at these temperatures show that AlN is a very promising candidate for elevated temperature applications.
引用
收藏
页码:859 / 864
页数:6
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