Examination of local structure of composite and low dimension semiconductor with X-ray absorption spectroscopy

被引:2
|
作者
Lawniczak-Jablonska, K.
Demchenko, I. N.
Piskorska, E.
Wolska, A.
Talik, E.
Zakharov, D. N.
Liliental-Weber, Z.
机构
[1] Polish Acad Sci, Inst Phys, PL-02668 Warsaw, Poland
[2] Silesian Univ, Inst Phys, PL-40007 Katowice, Poland
[3] Univ Calif Berkeley, Lawrence Berkeley Lab, Berkeley, CA 94720 USA
关键词
X-ray absorption; nanoparticles; colloids and quantum structures;
D O I
10.1016/j.jnoncrysol.2006.07.012
中图分类号
TQ174 [陶瓷工业]; TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
X-ray absorption methods have been successfully used to obtain quantitative information about the local atomic composition of two different materials. X-ray absorption near-edge structure analysis and X-ray photoelectron spectroscopy have allowed us to determine seven chemical compounds and their concentrations in a c-BN composite. The use of extended X-ray absorption Fine Structure in combination with transmission electron microscopy has enabled us to determine the composition and size of buried Ge quantum dots. It has been found that the quantum dots consisted of pure Ge cores covered by 1-2 monolayers of an Si-rich layer. (c) 2006 Elsevier B.V. All rights reserved.
引用
收藏
页码:4190 / 4199
页数:10
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