Copper electrodeposition from a chloride free deep eutectic solvent

被引：31
作者：
Bernasconi, Roberto [1 ]
Zebarjadi, Mandana [1 ]
Magagnin, Luca [1 ]
机构：
[1] Politecn Milan, Dipartimento Chim Mat & Ingn Chim Giulio Natta, I-20131 Milan, Italy
来源：
JOURNAL OF ELECTROANALYTICAL CHEMISTRY | 2015年 / 758卷
关键词：
Electrodeposition; Copper; Deep eutectic solvent; Choline dihydrogencitrate; ROOM-TEMPERATURE; CHOLINE CHLORIDE; IONIC LIQUIDS; ALLOYS; ALUMINUM; FILMS;
D O I：
10.1016/j.jelechem.2015.10.024
中图分类号：
O65 [分析化学];
学科分类号：
070302 ; 081704 ;
摘要：
The possibility of substituting choline chloride in the well-known choline chloride/ethylene glycol deep eutectic solvent is studied in the article. The substitution with choline dihydrogencitrate gives the possibility to maintain the choline moiety and to obtain an electrolyte free of chloride ions. Different ratios between choline dihydrogencitrate and ethylene glycol are tested to analyze the effect of this parameter on the behavior of the solution. Physical characterization and electrochemical investigation of the pure and the copper supplemented electrolytes are provided to properly link the chemistry of the electrolytes with their physical properties and their influence on metal electroreduction. From this point of view viscosity and conductivity of the new solutions are analyzed, highlighting,a strong influence of the first on the possibility of good quality metal plating. Copper deposition is successfully attempted on nickel and the resulting coatings are analyzed by mean of SEM, hardness measurements, XRD and microprofilometry. Good quality coatings can be easily obtained from a choline dihydrogencitrate/ethylene glycol deep eutectic solvent presenting the ratio 1:4 between the two chemicals. The coatings produced are compared as well with their homologues obtained from the well characterized choline chloride/ethylene glycol system, showing equivalent quality. (C) 2015 Elsevier B.V. All rights reserved.
引用
收藏
页码：163 / 169
页数：7
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