Transport study of a single bismuth nanowire fabricated by the silver and silicon nanowire shadow masks

被引:36
作者
Choi, D. S. [1 ]
Balandin, A. A.
Leung, M. S.
Stupian, G. W.
Presser, N.
Chung, S. W.
Heath, J. R.
Khitun, A.
Wang, K. L.
机构
[1] Univ Calif Los Angeles, Dept Elect Engn, Los Angeles, CA 90095 USA
[2] Univ Calif Riverside, Dept Elect Engn, Nanodevices Lab, Riverside, CA 92521 USA
[3] Aerosp Corp, Elect Photon Lab, El Segundo, CA 90245 USA
[4] Univ Calif Los Angeles, Dept Chem & Biochem, Los Angeles, CA 90095 USA
关键词
D O I
10.1063/1.2357847
中图分类号
O59 [应用物理学];
学科分类号
摘要
The authors have carried out measurements of the electrical conductivity of single bismuth nanowires fabricated by the low energy electron beam lithography using the silver/silicon nanowire shadow masks. The examined nanowires had cross-sectional dimensions of 40x30 and 40x50 nm(2). The chosen nanowire sizes had been slightly below the critical diameter D (similar to 50 nm) at which a semimetal to semiconductor phase transition was predicted to occur. The results reveal a semiconductorlike temperature dependence of the electrical conductivity of a bismuth nanowire, which is strikingly different from that of the bulk bismuth. (c) 2006 American Institute of Physics.
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页数:3
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