Analysis of resist pattern collapse by direct peeling method with atomic force microscope tip

被引：14

作者：

Kawai, A ^{[1
]}

Kaneko, Y ^{[1
]}

机构：

[1] Nagaoka Univ Technol, Dept Elect Engn, Nagaoka, Niigata, Japan

来源：

JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS | 2000年 / 39卷 / 3A期

关键词：

adhesion; collapse; atomic force microscopy; resist; finite-element method; internal stress; residue;

D O I：

10.1143/JJAP.39.1426

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

Quantitative analysis of the adhesion property of a KrF resist pattern is demonstrated experimentally. Dependency of the load for collapse on various line and L-shaped patterns, is investigated. By directly applying normal load with a microcantilever tip, a photoresist pattern adhering on a substrate can be collapsed easily. The adhesion strength of the L-shaped pattern is considerably large as compared with the line pattern. The reliability of this method is discussed together with the analysis of stress distribution in the KrF resist patterns.

引用

页码：1426 / 1429

页数：4

共 11 条

[1] ATOMIC FORCE MICROSCOPE [J].

BINNIG, G ;

QUATE, CF ;

GERBER, C .

PHYSICAL REVIEW LETTERS, 1986, 56 (09) :930-933

[2] PATTERNING CHARACTERISTICS OF A CHEMICALLY-AMPLIFIED NEGATIVE RESIST IN SYNCHROTRON RADIATION LITHOGRAPHY [J].

DEGUCHI, K ;

MIYOSHI, K ;

ISHII, T ;

MATSUDA, T .

JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS, 1992, 31 (9A) :2954-2958

[3] FRACTURE TESTING OF SILICON MICROELEMENTS INSITU IN A SCANNING ELECTRON-MICROSCOPE [J].

JOHANSSON, S ;

SCHWEITZ, JA ;

TENERZ, L ;

TIREN, J .

JOURNAL OF APPLIED PHYSICS, 1988, 63 (10) :4799-4803

[4] Analysis of adhesion behavior of micro resist pattern by direct collapse method with atomic force microscope tip [J].

Kawai, A .

METROLOGY, INSPECTION, AND PROCESS CONTROL FOR MICROLITHOGRAPHY XIII, PTS 1 AND 2, 1999, 3677 :565-573

[5] Collapse behavior of microresist pattern analyzed by the tip indentation method with an atomic force microscope [J].

Kawai, A .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1999, 17 (03) :1090-1093

[6]

KAWAI A, 1999, IN PRESS J ADHES SOC

[7]

Kawai A., 1994, J ADHES SOC JPN, V30, P549

[8] MECHANISM OF RESIST PATTERN COLLAPSE DURING DEVELOPMENT PROCESS [J].

TANAKA, T ;

MORIGAMI, M ;

ATODA, N .

JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 1993, 32 (12B) :6059-6064

[9] THEORY FOR THE ATOMIC FORCE MICROSCOPY OF DEFORMABLE SURFACES [J].

TOMANEK, D ;

OVERNEY, G ;

MIYAZAKI, H ;

MAHANTI, SD ;

GUNTHERODT, HJ .

PHYSICAL REVIEW LETTERS, 1989, 63 (08) :876-879

[10] Fracture testing of silicon microcantilever beams [J].

Wilson, CJ ;

Ormeggi, A ;

Narbutovskih, M .

JOURNAL OF APPLIED PHYSICS, 1996, 79 (05) :2386-2393

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