Monte Carlo simulation;
electron backscattering;
thin films;
D O I:
10.1002/sia.2370
中图分类号:
O64 [物理化学(理论化学)、化学物理学];
学科分类号:
070304 ;
081704 ;
摘要:
The backscattering coefficient of low-medium energy electron beams (from 250 to 10 000 eV) impinging on C/Al double layered thin films was investigated by a Monte Carlo simulation. The aim of the research was to study the behaviour of the backscattering coefficient as a function of the beam primary energy and the thicknesses of the two layers. The backscattering coefficient as a function of the primary energy presents features that can be used to evaluate the thicknesses of the two layers. Copyright (C) 2006 John Wiley & Sons, Ltd.