Monte Carlo simulation of low-medium energy electrons backscattered from C/Al double layer thin films

被引:10
作者
Dapor, Maurizio
机构
[1] IRST, ITC, I-38050 Trento, Italy
[2] Univ Trent, Dipartimento Fis, I-38050 Trento, Italy
关键词
Monte Carlo simulation; electron backscattering; thin films;
D O I
10.1002/sia.2370
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
The backscattering coefficient of low-medium energy electron beams (from 250 to 10 000 eV) impinging on C/Al double layered thin films was investigated by a Monte Carlo simulation. The aim of the research was to study the behaviour of the backscattering coefficient as a function of the beam primary energy and the thicknesses of the two layers. The backscattering coefficient as a function of the primary energy presents features that can be used to evaluate the thicknesses of the two layers. Copyright (C) 2006 John Wiley & Sons, Ltd.
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页码:1198 / 1203
页数:6
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