Status of diamond as membrane material for X-ray lithography masks

被引：13
作者：
Ravet, MF
Rousseaux, F
机构：
[1] Lab. Microstructures Microlectron., L2M-CNRS, 92225 Bagneux, 196 avenue H, Ravera
来源：
DIAMOND AND RELATED MATERIALS | 1996年 / 5卷 / 6-8期
关键词：
X-ray lithography; radiation; masks;
D O I：
10.1016/0925-9635(95)00373-8
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
One of the key factors in X-ray lithography using synchrotron radiation is the manufacture of reliable masks on suitable substrate materials. Because of its outstanding properties, chemically vapour deposited diamond is expected to be the ideal material for the next generation of X-ray masks. The membrane and mask technology requirements for high resolution X-ray lithography and for deep X-ray lithography are described in this paper. Diamond as a substrate material is critically compared with other membrane materials and the state of the art of diamond membranes for X-ray lithography applications is reviewed.
引用
收藏
页码：812 / 818
页数：7
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