Influence of Residual Facet Reflection on the Eye-Diagram Performance of High-Speed Electroabsorption Modulated Lasers

被引：14
|
作者：
Sun, Changzheng [1 ]
Xiong, Bing [1 ]
Wang, Jian [1 ]
Cai, Pengfei [1 ]
Xu, Jianming [1 ]
Zhou, Qiwei [1 ]
Luo, Yi [1 ]
机构：
[1] Tsinghua Univ, Dept Elect Engn, Tsinghua Natl Lab Informat Sci & Technol, State Key Lab Integrated Optoelect, Beijing 100084, Peoples R China
来源：
JOURNAL OF LIGHTWAVE TECHNOLOGY | 2009年 / 27卷 / 15期
关键词：
Anti-reflection (AR) coating; distributed feedback (DFB) lasers; electroabsorption (EA) modulators; eye-diagram; monolithic integration; optical reflection; DFB-LASERS; FEEDBACK; CHIRP;
D O I：
10.1109/JLT.2008.2007654
中图分类号：
TM [电工技术]; TN [电子技术、通信技术];
学科分类号：
0808 ; 0809 ;
摘要：
The influence of residual facet reflection on the small-signal modulation response and the large-signal eye-diagram performance of 40 Gb/s electroabsorption modulated lasers (EMLs) is studied. Measurement and simulation show that the eye-diagram performance is not only limited by the modulation bandwidth of the device, but also significantly degraded by the low frequency resonances in the frequency response due to residual facet reflection. Clear eye-opening has been demonstrated by optimizing the anti-reflection (AR) coating of the EA modulator facet.
引用
收藏
页码：2970 / 2976
页数：7
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