Dual ion beam sputtering vanadium dioxide microbolometers by surface micromachining

被引：15

作者：

Zintu, D ^{[1
]}

Tosone, G ^{[1
]}

Mercuri, A ^{[1
]}

机构：

[1] Consorzio CREO, I-67100 Laquila, Italy

来源：

INFRARED PHYSICS & TECHNOLOGY | 2002年 / 43卷 / 3-5期

关键词：

Electric conductivity - Ion beam assisted deposition - Micromachining - Sputter deposition - Vanadium compounds;

D O I：

10.1016/S1350-4495(02)00147-0

中图分类号：

TH7 [仪器、仪表];

学科分类号：

0804 ; 080401 ; 081102 ;

摘要：

Suspended microbolometers have been realized by surface micromachining. The sensible film was vanadium dioxide, deposited by the dual ion beam sputtering technique. The film has a TCR of -3% K-1 and a resistivity of few Q cm. The best performances measured on such microbolometers are close to the state of the art: the detectivity is up to 10(8) cm Hz(1/2)/W and the response time is few milliseconds. (C) 2002 Elsevier Science B.V. All rights reserved.

引用

页码：245 / 250

页数：6