Dual ion beam sputtering vanadium dioxide microbolometers by surface micromachining

被引：15
|
作者：
Zintu, D [1 ]
Tosone, G [1 ]
Mercuri, A [1 ]
机构：
[1] Consorzio CREO, I-67100 Laquila, Italy
来源：
INFRARED PHYSICS & TECHNOLOGY | 2002年 / 43卷 / 3-5期
关键词：
Electric conductivity - Ion beam assisted deposition - Micromachining - Sputter deposition - Vanadium compounds;
D O I：
10.1016/S1350-4495(02)00147-0
中图分类号：
TH7 [仪器、仪表];
学科分类号：
0804 ; 080401 ; 081102 ;
摘要：
Suspended microbolometers have been realized by surface micromachining. The sensible film was vanadium dioxide, deposited by the dual ion beam sputtering technique. The film has a TCR of -3% K-1 and a resistivity of few Q cm. The best performances measured on such microbolometers are close to the state of the art: the detectivity is up to 10(8) cm Hz(1/2)/W and the response time is few milliseconds. (C) 2002 Elsevier Science B.V. All rights reserved.
引用
收藏
页码：245 / 250
页数：6
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