Influence of ambient gas ionization on the deposition of clusters formed in an ablation plume

被引：13

作者：

Bailini, A. ^{[1
]}

Ossi, P. M. ^{[1
]}

机构：

[1] Politecn Milan, Dipartimento Ingn Nucl, Ctr Excellence NanoEngn Mat & Surfaces, I-20133 Milan, Italy

来源：

APPLIED SURFACE SCIENCE | 2006年 / 252卷 / 13期

关键词：

pulsed laser deposition; plume dynamics; ionization; cluster-assembled films; carbon;

D O I：

10.1016/j.apsusc.2005.06.051

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

The effect of inert gas ionization on the dynamics of a laser ablation plume expanding through a background inert gas is studied. Charge transfer reactions between ablated ions and neutral background gas atoms yield to the formation of a charged layer on the plume expansion front. The energy lost by ablated ions when the plume is slowed down is calculated. The observed microstructure differences between carbon films prepared by pulsed laser deposition in helium, where the ionization mechanism is absent and respectively in argon, where it is present, are well correlated to model predictions. (c) 2005 Elsevier B.V. All rights reserved.

引用

页码：4364 / 4367

页数：4

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