共 38 条
Preparation of composite micro/nano structure on the silicon surface by reactive ion etching: Enhanced anti-reflective and hydrophobic properties
被引:32
作者:

Zeng, Yu
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Southwest Univ Sci & Technol, Joint Lab Extreme Condit Matter Properties, Mianyang 621010, Peoples R China
Sichuan Civil Mil Integrat Inst, Mianyang 621010, Peoples R China Southwest Univ Sci & Technol, Joint Lab Extreme Condit Matter Properties, Mianyang 621010, Peoples R China

Fan, Xiaoli
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机构:
Southwest Univ Sci & Technol, Joint Lab Extreme Condit Matter Properties, Mianyang 621010, Peoples R China
Sichuan Civil Mil Integrat Inst, Mianyang 621010, Peoples R China Southwest Univ Sci & Technol, Joint Lab Extreme Condit Matter Properties, Mianyang 621010, Peoples R China

Chen, Jiajia
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Southwest Univ Sci & Technol, Joint Lab Extreme Condit Matter Properties, Mianyang 621010, Peoples R China
Sichuan Civil Mil Integrat Inst, Mianyang 621010, Peoples R China Southwest Univ Sci & Technol, Joint Lab Extreme Condit Matter Properties, Mianyang 621010, Peoples R China

He, Siyu
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Southwest Univ Sci & Technol, Joint Lab Extreme Condit Matter Properties, Mianyang 621010, Peoples R China
Sichuan Civil Mil Integrat Inst, Mianyang 621010, Peoples R China Southwest Univ Sci & Technol, Joint Lab Extreme Condit Matter Properties, Mianyang 621010, Peoples R China

Yi, Zao
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h-index: 0
机构:
Southwest Univ Sci & Technol, Joint Lab Extreme Condit Matter Properties, Mianyang 621010, Peoples R China
Sichuan Civil Mil Integrat Inst, Mianyang 621010, Peoples R China Southwest Univ Sci & Technol, Joint Lab Extreme Condit Matter Properties, Mianyang 621010, Peoples R China

Ye, Xin
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h-index: 0
机构:
China Acad Engn Phys, Res Ctr Laser Fus, Mianyang 621010, Peoples R China Southwest Univ Sci & Technol, Joint Lab Extreme Condit Matter Properties, Mianyang 621010, Peoples R China

Yi, Yougen
论文数: 0 引用数: 0
h-index: 0
机构:
Cent S Univ, Coll Phys & Elect, Changsha 410083, Hunan, Peoples R China Southwest Univ Sci & Technol, Joint Lab Extreme Condit Matter Properties, Mianyang 621010, Peoples R China
机构:
[1] Southwest Univ Sci & Technol, Joint Lab Extreme Condit Matter Properties, Mianyang 621010, Peoples R China
[2] Sichuan Civil Mil Integrat Inst, Mianyang 621010, Peoples R China
[3] China Acad Engn Phys, Res Ctr Laser Fus, Mianyang 621010, Peoples R China
[4] Cent S Univ, Coll Phys & Elect, Changsha 410083, Hunan, Peoples R China
基金:
中国国家自然科学基金;
关键词:
Composite micro/nano structure;
Wet chemical etching;
Reactive ion etching(RIE);
Anti-reflection;
Hydrophobicity;
BROAD-BAND;
SOLAR-CELLS;
FABRICATION;
NANOSTRUCTURES;
EFFICIENCY;
EMISSION;
ARRAYS;
D O I:
10.1016/j.spmi.2018.03.035
中图分类号:
O469 [凝聚态物理学];
学科分类号:
070205 ;
摘要:
A silicon substrate with micro-pyramid structure (black silicon) is prepared by wet chemical etching and then subjected to reactive ion etching (RIE) in the mixed gas condition of SF6, CHF3 and He. We systematically study the impacts of flow rates of SF6, CHF3 and He, the etching pressure and the etching time on the surface morphology and reflectivity through various characterizations. Meanwhile, we explore and obtain the optimal combination of parameters for the preparation of composite structure that match the RIE process based on the basis of micro-pyramid silicon substrate. The composite sample prepared under the optimum parameters exhibits excellent anti-reflective performance, hydrophobic, self-cleaning and anti-corrosive properties. Based on the above characteristics, the composite micro/nano structure can be applied to solar cells, photo detectors, LEDs, outdoor devices and other important fields. (C) 2018 Elsevier Ltd. All rights reserved.
引用
收藏
页码:144 / 154
页数:11
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