Thermoelectric transport perpendicular to thin-film heterostructures calculated using the Monte Carlo technique

被引:43
作者
Zebarjadi, Mona [1 ]
Shakouri, Ali
Esfarjani, Keivan
机构
[1] Univ Calif Santa Cruz, Dept Elect Engn, Santa Cruz, CA 95064 USA
[2] Sharif Univ Technol, Dept Phys, Tehran 113659161, Iran
[3] Univ Calif Santa Cruz, Dept Phys, Santa Cruz, CA 95064 USA
关键词
D O I
10.1103/PhysRevB.74.195331
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
The Monte Carlo technique is used to calculate electrical as well as thermoelectric transport properties across thin-film heterostructures. We study a thin InGaAsP barrier layer sandwiched between two InGaAs contact layers, when the barrier thickness is in the 50 nm-2000 nm range. We found that with decreasing size, the effective Seebeck coefficient is increased substantially. The transition between pure ballistic thermionic transport and fully diffusive thermoelectric transport is also described.
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页数:6
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