ECR-plasma parameters and properties of thin DLC films

被引：12

作者：

Inaba, H

Fujimaki, S

Furusawa, K

Todoroki, S

机构：

[1] Hitachi Ltd, Prod Engn Res Lab, Totsuka Ku, Yokohama, Kanagawa 2440817, Japan

[2] Hitachi Ltd, Data Storage Syst Div, Odawara, Kanagawa 2568510, Japan

来源：

VACUUM | 2002年 / 66卷 / 3-4期

关键词：

ECR; CVD; DLC; CH4; carbon; radical; ion; plasma;

D O I：

10.1016/S0042-207X(02)00120-3

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

We studied the correlation between CH4-plasma parameters and the properties of thin diamond-like carbon films deposited using electron-cyclotron-resonance chemical vapor deposition. The deposition was done with the contribution of the ions incident to the sample. We attribute the high quality of the films to the ions penetrating the sample and transferring their energy at 16 eV/Angstrom with a flux density same as that of radicals. (C) 2002 Elsevier Science Ltd. All rights reserved.

引用

页码：487 / 493

页数：7

共 14 条

[1] Control of plasma parameters for high-quality hydrogenated amorphous carbon growth [J].

Azuma, K ;

Inaba, H ;

Tasaka, K ;

Fujimaki, S ;

Shirai, H .

JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 2000, 39 (11) :6427-6431

[2] Structural study of ultrathin hydrogenated amorphous carbon films using spectroscopic ellipsometry and ultraviolet Raman spectroscopy [J].

Azuma, K ;

Inaba, H ;

Tasaka, K ;

Shirai, H .

JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 2000, 39 (12A) :6705-6707

[3] Deposition of DLC films using magnetron plasma in an unbalanced magnetic field [J].

Fujimaki, S ;

Kashiwase, H ;

Kokaku, Y ;

Ohno, T ;

Honda, Y ;

Inaba, H .

INTERNATIONAL JOURNAL OF MODERN PHYSICS B, 2000, 14 (2-3) :125-135

[4]

INABA H, 1999, VAC SOC JPN, V42, P565

[5]

LINDHARD J, 1968, KGL DANSKE VIDENSKAB, V36, P10

[6] ANALYTICAL CALCULATION OF ENERGY-SPECTRA OF KEV LIGHT PARTICLES REFLECTED FROM SOLID-SURFACES [J].

MORITA, K .

JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 1983, 22 (07) :1112-1118

[7] DEPOSITION MECHANISMS FOR PROMOTING SP(3) BONDING IN DIAMOND-LIKE CARBON [J].

ROBERTSON, J .

[8]

ROBERTSON J, 1993, J NONCRYST SOLIDS, V164, P1115

[9] APPEARANCE MASS-SPECTROMETRY OF NEUTRAL RADICALS IN RADIO-FREQUENCY PLASMAS [J].

SUGAI, H ;

TOYODA, H .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1992, 10 (04) :1193-1200

[10] DIAGNOSTICS AND MODELING OF A METHANE PLASMA USED IN THE CHEMICAL VAPOR-DEPOSITION OF AMORPHOUS-CARBON FILMS [J].

TACHIBANA, K ;

NISHIDA, M ;

HARIMA, H ;

URANO, Y .

JOURNAL OF PHYSICS D-APPLIED PHYSICS, 1984, 17 (08) :1727-1742

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