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Confinement of Ferroelectric Domain-Wall Motion at Artificially Formed Conducting-Nanofilaments in Epitaxial BiFeO3 Thin Films
被引:21
|作者:
Kim, Woo-Hee
[1
]
Son, Jong Yeog
[2
]
Jane, Hyun Myung
[3
,4
]
机构:
[1] Stanford Univ, Dept Chem Engn, Stanford, CA 94305 USA
[2] Kyung Hee Univ, Coll Appl Sci, Dept Appl Phys, Yongin 446701, South Korea
[3] Pohang Univ Sci & Technol POSTECH, Dept Mat Sci & Engn, Pohang 790784, South Korea
[4] Pohang Univ Sci & Technol POSTECH, Dept Phys, Pohang 790784, South Korea
基金:
新加坡国家研究基金会;
关键词:
BiFeO3 thin film;
ferroelectric response;
resistive switching;
conducting-filament;
domain-wall motion;
ELECTRICAL-PROPERTIES;
LA SUBSTITUTION;
RESOLUTION;
BEHAVIOR;
D O I:
10.1021/am501630k
中图分类号:
TB3 [工程材料学];
学科分类号:
0805 ;
080502 ;
摘要:
We report confinement of ferroelectric domain-wall motion at conducting-nanofilament wall in epitaxial BiFeO3 thin film on Nb-doped SrTiO3 substrate. The BiFeO3 film exhibited well-defined ferroelectric response and unipolar resistive switching behavior. We artificially formed conducting-nanofilaments in the BiFeO3 via conducting atomic force microscope techniques. The conducting-nanofilament wall, which does not possess any ferroelectric polarization, is then able to block domain propagation. Consequently, we demonstrate that the domain-wall motion is effectively confined within the conducting-nanofilament wall during polarization switching. This significant new insight potentially gives an opportunity for the artificial manipulation of nanoscale ferroelectric domain.
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页码:6346 / 6350
页数:5
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