Direct estimation and correction of residual aberrations in the reconstructed exit-wavefunction of a crystalline specimen

被引:2
作者
Chen, Z. K. [1 ]
Ming, W. Q. [1 ]
He, Y. T. [1 ]
Shen, R. H. [1 ]
Chen, G. S. [1 ]
Yin, M. J. [2 ]
Chen, J. H. [1 ]
机构
[1] Hunan Univ, Coll Mat Sci & Engn, Ctr High Resolut Electron Microscopy, Changsha 410082, Hunan, Peoples R China
[2] Shenzhen Univ, Electron Microscopy Ctr, Shenzhen 518060, Guangdong, Peoples R China
基金
中国国家自然科学基金;
关键词
Exit wavefunction; Transmission electron microscopy; Residual aberrations; Multiple solution problem; Minimum amplitude contrast; OFF-AXIS HOLOGRAPHY; HIGH-RESOLUTION TEM; ELECTRON-MICROSCOPY; PHASE; HRTEM; DECONVOLUTION; STABILITY; ALGORITHM;
D O I
10.1016/j.micron.2022.103247
中图分类号
TH742 [显微镜];
学科分类号
摘要
Measuring residual aberrations up to second order using a crystalline specimen in transmission electron microscope is challenging. Here, we show by good examples of both experimental and simulated images that it is feasible to measure aberrations up to the second-order, using minimum amplitude contrast criterion for the exit wave function reconstructed. We propose a two-steps strategy for the task: (i) Firstly measuring defocus and twofold astigmatism simultaneously to avoid error accumulation and to reduce the number of dimensions in parameters space. (ii) Then, with minimized misleading effects (or errors) in defocus and two-fold astigmatism, estimations of three-fold astigmatism and coma can be conducted more efficiently and effectively. Influences of other factors such as specimen structure, resolution and specimen thickness on the validity of the method are also discussed in detail. Our study provides a practical procedure for correcting residual aberrations in image wave using crystalline materials, which can then facilitate application of exit wave reconstruction technique to materials research.
引用
收藏
页数:10
相关论文
共 28 条
[1]   Exit wave reconstruction at atomic resolution [J].
Allen, LJ ;
McBride, W ;
O'Leary, NL ;
Oxley, MP .
ULTRAMICROSCOPY, 2004, 100 (1-2) :91-104
[2]   On the optical stability of high-resolution transmission electron microscopes [J].
Barthel, J. ;
Thust, A. .
ULTRAMICROSCOPY, 2013, 134 :6-17
[3]   Aberration measurement in HRTEM: Implementation and diagnostic use of numerical procedures for the highly precise recognition of diffractogram patterns [J].
Barthel, J. ;
Thust, A. .
ULTRAMICROSCOPY, 2010, 111 (01) :27-46
[4]   Atomic pillar-based nanoprecipitates strengthen AlMgSi alloys [J].
Chen, JH ;
Costan, E ;
van Huis, MA ;
Xu, Q ;
Zandbergen, HW .
SCIENCE, 2006, 312 (5772) :416-419
[5]   Atomic imaging in aberration-corrected high-resolution transmission electron microscopy [J].
Chen, JH ;
Zandbergen, HW ;
Van Dyck, D .
ULTRAMICROSCOPY, 2004, 98 (2-4) :81-97
[6]   Maximum-likelihood method for focus-variation image reconstruction in high resolution transmission electron microscopy [J].
Coene, WMJ ;
Thust, A ;
deBeeck, M ;
VanDyck, D .
ULTRAMICROSCOPY, 1996, 64 (1-4) :109-135
[7]   Wave function reconstruction in HRTEM: The parabola method [J].
deBeeck, MO ;
VanDyck, D ;
Coene, W .
ULTRAMICROSCOPY, 1996, 64 (1-4) :167-183
[8]   Fast two-dimensional phase-unwrapping algorithm based on sorting by reliability following a noncontinuous path [J].
Herráez, MA ;
Burton, DR ;
Lalor, MJ ;
Gdeisat, MA .
APPLIED OPTICS, 2002, 41 (35) :7437-7444
[9]   Multiple solution in maximum entropy deconvolution of high resolution electron microscope images [J].
Huang, DX ;
He, WZ ;
Li, FH .
ULTRAMICROSCOPY, 1996, 62 (03) :141-148
[10]   ABERRATION CORRECTION USING OFF-AXIS HOLOGRAPHY .1. ABERRATION ASSESSMENT [J].
ISHIZUKA, K ;
TANJI, T ;
TONOMURA, A ;
OHNO, T ;
MURAYAMA, Y .
ULTRAMICROSCOPY, 1994, 53 (04) :361-370