Fabrication and simulation of neutral-beam-etched silicon nanopillars

被引:5
作者
Chuang, Min-Hui [1 ,2 ]
Ohori, Daisuke [2 ,3 ,4 ]
Li, Yiming [1 ,2 ,3 ,4 ]
Chou, Kuan-Ru [1 ,3 ]
Samukawa, Seiji [4 ,5 ]
机构
[1] Natl Chiao Tung Univ, Parallel & Sci Comp Lab, 1001 Ta Hsueh Rd, Hsinchu 300, Taiwan
[2] Natl Chiao Tung Univ, Inst Commun Engn, 1001 Ta Hsueh Rd, Hsinchu 300, Taiwan
[3] Natl Chiao Tung Univ, Dept Elect & Comp Engn, 1001 Ta Hsueh Rd, Hsinchu 300, Taiwan
[4] Natl Chiao Tung Univ, Ctr MmWave Radar Syst & Technol, 1001 Ta Hsueh Rd, Hsinchu 300, Taiwan
[5] Tohoku Univ, Inst Fluid Sci, Aoba Ku, 2-1-1 Katahira, Sendai, Miyagi 9808577, Japan
关键词
Silicon nanopillar; Fabrication process; Neutral-beam etching; Energy-band profile; Simulation;
D O I
10.1016/j.vacuum.2020.109577
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
In this study, we do the experiment and simulation of the silicon nanopillars fabricated by a damage-free neutral-beam-etching system combined with bio-template-mask technology. The fabricated silicon nanopillars are with the diameter of 16 nm and the height of 90 nm and the density is 6.5 x 10(10) /cm(2) with variation of 3%. We model and simulate the fabricated silicon nanopillars by periodical cylinder in Si0.7Ge0.3 matrix to estimate the energy profile with different wave vectors. The variations of the energy with respect to the height, diameter, and the separation of the simulated silicon nanopillars are reported. The results of this work will be useful for thermoelectric applications.
引用
收藏
页数:5
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