Reaction mechanisms in laser-assisted chemical vapor deposition of microstructures

被引：0

作者：

Pauleau, Y ^{[1
]}

Tonneau, D ^{[1
]}

机构：

[1] Inst Natl Polytech Grenoble, Ctr Natl Rech Sci, LEMD, F-38031 Grenoble, France

来源：

CHEMICAL PHYSICS OF THIN FILM DEPOSITION PROCESSES FOR MICRO- AND NANO- TECHNOLOGIES | 2002年 / 55卷

关键词：

D O I：

暂无

中图分类号：

O646 [电化学、电解、磁化学];

学科分类号：

081704 ;

摘要：

引用

页码：223 / 254

页数：32

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