Ion projection direct structuring for patterning of magnetic media

被引：24

作者：

Dietzel, A ^{[1
]}

Berger, R

Grimm, H

Bruenger, WH

Dzionk, C

Letzkus, F

Springer, R

Loeschner, H

Platzgummer, E

Stengl, G

Bandic, ZZ

Terris, BD

机构：

[1] IBM Corp, Storage Technol Div, D-55015 Mainz, Germany

[2] ISiT, Fraunhofer Inst Siliziumtechnol, D-25524 Itzehoe, Germany

[3] IMS Chips, D-70569 Stuttgart, Germany

[4] IMS Nanofabricat GmbH, A-1020 Vienna, Austria

[5] IBM Corp, Almaden Res Ctr, San Jose, CA 95120 USA

来源：

IEEE TRANSACTIONS ON MAGNETICS | 2002年 / 38卷 / 05期

关键词：

Co-Pt multilayers; ion projection structuring; patterned magnetic storage media; stencil masks;

D O I：

10.1109/TMAG.2002.802846

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

Ion projection facilitates a direct structuring, which Is an attractive potential manufacturing process for patterned storage media. An advantage to this method is that the media roughness remaines unchanged. The feasibility of ion projection direct structuring for processing full disk surfaces was investigated using a next generation lithography projector. Co-Pt multilayer films with strong perpendicular anisotropy were deposited on 1-in glass disks as used in the IBM microdrive and on Si substrates. Concentric tracks including data, as well as head positioning servo structures, were patterned in a single exposure step with 45 keV He+ at a 4 x demagnification. In a second experiment, sub-100-nm magnetic islands were produced using projection at 8.7 x demagnification and visualized by magnetic force microscopy.

引用

页码：1952 / 1954

页数：3

共 10 条

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