X-ray diffraction line broadening by stacking faults in SrBi2Nb2O9/SrTiO3 epitaxial thin films

被引:0
作者
Boulle, A. [1 ]
Legrand, C. [2 ]
Guinebretiere, R. [1 ]
Mercurio, J. P. [2 ]
Dauger, A. [1 ]
机构
[1] CNRS UMR 6638, Sci Proc Ceram & Traitements Surface, F-87065 Limoges, France
[2] Fac Sci, F-87060 Limoges, France
来源
ACTA CRYSTALLOGRAPHICA A-FOUNDATION AND ADVANCES | 2000年 / 56卷
关键词
X-ray diffraction; line profile analysis; Aurivillius compound;
D O I
10.1107/S0108767300028294
中图分类号
O6 [化学];
学科分类号
0703 ;
摘要
o.m8.p2
引用
收藏
页码:S399 / S399
页数:1
相关论文
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