Electrical and structural investigation of triangular defects in 4H-SiC junction barrier Schottky devices

被引:39
作者
Berechman, R. A. [1 ]
Skowronski, M. [1 ]
Zhang, Q. [1 ,2 ]
机构
[1] Carnegie Mellon Univ, Dept Mat Sci & Engn, Pittsburgh, PA 15213 USA
[2] Cree Inc, Durham, NC 27703 USA
关键词
CRYSTAL DEFECTS; SILICON-CARBIDE; GROWTH; PERFORMANCE; INCLUSIONS; MECHANISM; DIODES; IMPACT; FILMS; ANGLE;
D O I
10.1063/1.3103308
中图分类号
O59 [应用物理学];
学科分类号
摘要
The structure and effects of triangular-shaped defects in 4H-SiC junction barrier Schottky devices were investigated using I-V measurements, infrared microscopy, electron beam induced current, electroluminescence, and transmission electron microscopy. Thermal imaging of devices under reverse bias detected hot spots at the locations of triangular defects. Electroluminescence images determined the position of the leakage currents at the triangular defect sides near the p-n metallurgical junction. The triangular defects consist of macroscopic (1 mu m thick) 3C-SiC platelets embedded in the 4H-SiC matrix. (C) 2009 American Institute of Physics. [DOI: 10.1063/1.3103308]
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页数:7
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