Low-Frequency Noise Characteristics of Gallium-Doped ZnO Nanosheets as Photodetectors

被引:3
|
作者
Yang, C. C. [1 ,2 ]
Su, Y. K. [1 ,2 ,3 ]
Hsiao, C. H. [1 ,2 ]
Kao, T. H. [1 ,2 ]
Peng, Y. M. [1 ,2 ]
Chuang, M. Y. [1 ,2 ]
Wang, B. C. [4 ]
Wu, S. L. [5 ]
机构
[1] Natl Cheng Kung Univ, Adv Optoelect Technol Ctr, Ctr Micro Nano Sci & Technol, Inst Microelect, Tainan 701, Taiwan
[2] Natl Cheng Kung Univ, Adv Optoelect Technol Ctr, Ctr Micro Nano Sci & Technol, Dept Elect Engn, Tainan 701, Taiwan
[3] Kun Shan Univ, Dept Elect Engn, Tainan 710, Taiwan
[4] Powerchip Technol Corp, Hsinchu 300, Taiwan
[5] Cheng Shiu Univ, Dept Elect Engn, Kaohsiung 833, Taiwan
关键词
UV PHOTODETECTORS;
D O I
10.1149/2.093406jes
中图分类号
O646 [电化学、电解、磁化学];
学科分类号
081704 ;
摘要
This study reports the growth of vertically aligned gallium (Ga)-doped ZnO (GZO) nanosheets (NSs) on a glass substrate using low temperature (90 degrees C) hydrothermal method. The GZO NSs exhibited hexagonal wurtzite structures with a sharp morphology, with average length and diameter of approximately 720 and 26 nm, respectively. A GZO NS metal-semiconductor-metal (MSM) ultraviolet photodetector (PD) was also fabricated. The UV-to-visible rejection ratio of the fabricated PD was approximately 81 when biased at 1 V with a sharp cutoff at 340 nm. With an incident light wavelength of 340 nm and an applied bias of 1 V, the measured responsivity of the PD was 2.83 x 10(-5) A/W. Furthermore, the noise equivalent power (NEP) and detectivity of the fabricated GZO NS MSM PD were 5.92 x 10(-9) W and 2.24 x 10(9) cm.Hz(0.5).W-1, respectively. (C) 2014 The Electrochemical Society. All rights reserved.
引用
收藏
页码:H399 / H403
页数:5
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