Effects of anodisation parameters on thin film properties: a review

被引：4
|
作者：
Wong, Y. H. [1 ]
Affendy, M. G. [1 ,2 ]
Lau, S. K. [1 ]
Teh, P. C. [1 ]
Lee, H. J. [3 ]
Tan, C. Y. [1 ]
Ramesh, S. [1 ]
机构：
[1] Univ Malaya, Dept Mech Engn, Fac Engn, Kuala Lumpur 50603, Malaysia
[2] Univ Birmingham, Sch Met & Mat, Birmingham B15 2TT, W Midlands, England
[3] Univ Tenaga Nas, Ctr Photon Technol, Bandar Baru Bangi 43650, Selangor, Malaysia
来源：
MATERIALS SCIENCE AND TECHNOLOGY | 2017年 / 33卷 / 06期
关键词：
Anodisation; Thin films; Applied voltage; Temperature; Thickness; ANODIC OXIDE-FILMS; ZRO2; FILMS; ELECTRICAL CHARACTERISTICS; DIELECTRIC-CONSTANT; TITANIUM-OXIDE; PURE TITANIUM; PHOTO-CVD; ZIRCONIUM; OXIDATION; GROWTH;
D O I：
10.1080/02670836.2016.1193654
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
Electrochemical anodisation is a well-received method in the complementary metal-oxide-semiconductor field as it is advantageous; best performed at room temperature which translates into being more affordable and a simple alternative to form nano-structured oxide films for different metals. The quintessential parameters involved allow numerous formations of metal oxide films according to desired morphology and thickness. Therefore, this paper aims to review the effects of anodising parameters such as applied voltage, concentration, temperature, time, current density and post-anodisation annealing among them.
引用
收藏
页码：699 / 711
页数：13
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