Structural relaxation of amorphous silicon carbide

被引:126
|
作者
Ishimaru, M [1 ]
Bae, IT
Hirotsu, Y
Matsumura, S
Sickafus, KE
机构
[1] Osaka Univ, Inst Sci & Ind Res, Osaka 5670047, Japan
[2] Osaka Univ, Fac Engn, Dept Mat Sci & Engn, Suita, Osaka 5650871, Japan
[3] Kyushu Univ, Dept Appl Quantum Phys & Nucl Engn, Fukuoka 8128581, Japan
[4] Kyushu Univ, Dept Energy Sci & Engn, Fukuoka 8128581, Japan
[5] Los Alamos Natl Lab, Div Mat Sci & Technol, Los Alamos, NM 87545 USA
基金
日本科学技术振兴机构;
关键词
D O I
10.1103/PhysRevLett.89.055502
中图分类号
O4 [物理学];
学科分类号
0702 ;
摘要
We have examined amorphous structures of silicon carbide (SiC) using both transmission electron microscopy and a molecular-dynamics approach. Radial distribution functions revealed that amorphous SiC contains not only heteronuclear (Si-C) bonds but also homonuclear (Si-Si and C-C) bonds. The ratio of heteronuclear to homonuclear bonds was found to change upon annealing, suggesting that structural relaxation of the amorphous SiC occurred. Good agreement was obtained between the simulated and experimentally measured radial distribution functions.
引用
收藏
页数:4
相关论文
共 50 条
  • [21] Amorphous silicon carbide TFTs
    Estrada, M.
    Cerdeira, A.
    Resendiz, L.
    Garcia, R.
    Iniguez, B.
    Marsal, L. F.
    Pallares, J.
    SOLID-STATE ELECTRONICS, 2006, 50 (03) : 460 - 467
  • [22] Structural memory model of slow defect relaxation in hydrogenated amorphous silicon
    Branz, HM
    Unold, T
    Fedders, PA
    JOURNAL OF NON-CRYSTALLINE SOLIDS, 1996, 200 : 535 - 539
  • [23] Density changes and viscous flow during structural relaxation of amorphous silicon
    1600, American Inst of Physics, Woodbury, NY, USA (74):
  • [24] GENERALIZED DEFECT ANNIHILATION KINETICS FOR STRUCTURAL RELAXATION IN AMORPHOUS-SILICON
    SHIN, JH
    ATWATER, HA
    PHILOSOPHICAL MAGAZINE B-PHYSICS OF CONDENSED MATTER STATISTICAL MECHANICS ELECTRONIC OPTICAL AND MAGNETIC PROPERTIES, 1995, 72 (01): : 1 - 11
  • [25] Structural relaxation of amorphous silicon during thermal and CW laser annealing
    Gamulin, O
    Ivanda, M
    Desnica, UV
    Furic, K
    JOURNAL OF NON-CRYSTALLINE SOLIDS, 1998, 227 : 943 - 948
  • [26] STRUCTURAL RELAXATION IN AMORPHOUS-SILICON PREPARED BY ION-IMPLANTATION
    HIROYAMA, Y
    MOTOOKA, T
    TOKUYAMA, T
    WEI, L
    TANIGAWA, S
    NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 1993, 80-1 : 982 - 985
  • [27] Solid phase epitaxial regrowth of amorphous silicon is not affected by structural relaxation
    Roorda, S.
    Lavigueur, Y.
    PHILOSOPHICAL MAGAZINE, 2010, 90 (29) : 3787 - 3794
  • [28] Electrical and structural properties of rapid thermal annealed amorphous silicon carbide films
    Choi, WK
    Ong, TY
    Han, LJ
    Loh, FC
    Tan, KL
    PHYSICA STATUS SOLIDI A-APPLIED RESEARCH, 1998, 169 (01): : 67 - 76
  • [29] INFLUENCE OF HYDROGEN ON THE EVOLUTION OF STRUCTURAL-PROPERTIES OF AMORPHOUS-SILICON CARBIDE
    DELLAMEA, G
    DEMICHELIS, F
    PIRRI, CF
    RAVA, P
    RIGATO, V
    STAPINSKI, T
    TRESSO, E
    JOURNAL OF NON-CRYSTALLINE SOLIDS, 1991, 137 : 95 - 98
  • [30] INFLUENCE OF DOPING ON THE STRUCTURAL AND OPTOELECTRONIC PROPERTIES OF AMORPHOUS AND MICROCRYSTALLINE SILICON-CARBIDE
    DEMICHELIS, F
    PIRRI, CF
    TRESSO, E
    JOURNAL OF APPLIED PHYSICS, 1992, 72 (04) : 1327 - 1333