Carbon reduction and antimony incorporation in InGaAsSb films grown by metalorganic molecular beam epitaxy using tris-dimethylaminoantimony

被引:8
|
作者
Mitsuhara, Manabu [1 ]
Sato, Tomonari [1 ]
Yamamoto, Norio [1 ]
Fukano, Hideki [1 ]
Kondo, Yasuhiro [1 ]
机构
[1] NTT Corp, NTT Photon Labs, Kanagawa 2430198, Japan
关键词
Metalorganic molecular beam epitaxy; Antimonides; Semiconducting III-V materials; Semiconducting quarternary alloys; BAND-GAP; ALLOYS; GAAS; GAINASSB; LAYERS; MOMBE; GASB;
D O I
10.1016/j.jcrysgro.2009.06.011
中图分类号
O7 [晶体学];
学科分类号
0702 ; 070205 ; 0703 ; 080501 ;
摘要
InGaAsSb layers nearly lattice-matched to InP were grown by metalorganic molecular beam epitaxy using tris-dimethylaminoantimony (TDMASb). Secondary-ion mass spectroscopy measurements revealed that TDMASb is useful not only as an Sb source but also as an additive that reduces the incorporation of C into the film from group-III metalorganic sources. In the room-temperature photoluminescence spectrum, the incorporation of Sb into InGaAs shifted the peak wavelength from 1.66 to 1.75 mu m and, simultaneously, the peak intensity of InGaAsSb became more than twice that of InGaAs. (C) 2009 Elsevier B.V. All rights reserved.
引用
收藏
页码:3636 / 3639
页数:4
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