Production of capacitive films from Mn thin films: Effects of current density and film thickness

被引:24
作者
Djurfors, B.
Broughton, J. N.
Brett, M. J.
Ivey, D. G. [1 ]
机构
[1] Univ Alberta, Dept Chem & Mat Engn, Edmonton, AB T6G 2G6, Canada
[2] Univ Alberta, Dept Elect & Comp Engn, Edmonton, AB T6G 2V4, Canada
基金
加拿大自然科学与工程研究理事会;
关键词
scanning electron microscopy; manganese oxide; electrochemical supercapacitor; physical vapor deposition; x-ray photoelectron spectroscopy;
D O I
10.1016/j.jpowsour.2005.06.011
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
Electrochemical oxidation of Mn thin films produces a highly capacitive, porous MnO2 surface layer. The effects of current density and deposited Mn layer thickness on the morphology of the porous surface layer are quite pronounced. A higher current density results in a much thinner, finer porous layer while thicker deposited Mn films give much thicker porous films. Increasing the current density results in a film with greater hydration and an increase in capacitance. For the films of varying deposited layer thickness, oxidation occurs at a single current density and, as a result, the relative hydration of the film does not change noticeably. Increasing the deposited layer thickness results in a porous surface layer that increases in thickness, but with a constant amount of hydration. This combination of trends results in a significant increase in the areal capacitance of the film but little change in the specific capacitance. (c) 2005 Elsevier B.V. All rights reserved.
引用
收藏
页码:741 / 747
页数:7
相关论文
共 14 条