Nanoporous InGaN prepared by KOH electrochemical etching with different light sources

被引:7
作者
Radzali, R. [1 ,2 ]
Hassan, Z. [1 ]
Zainal, N. [1 ]
Yam, F. K. [1 ]
机构
[1] Univ Sains Malaysia, Sch Phys, Nanooptoelect Res & Technol Lab, George Town 11800, Malaysia
[2] Univ Teknol MARA, Fac Elect Engn, Selangor, Malaysia
关键词
Porous InGaN; KOH; Electrochemical etching; Xenon illumination; UV illumination; GAN THIN-FILMS; POROUS GAN; OPTICAL-PROPERTIES; ALN BUFFER; PHOTOCONDUCTIVITY; ULTRAVIOLET; SUBSTRATE; QUALITY; SI(111); STRESS;
D O I
10.1016/j.mee.2014.06.027
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
A number of porous InGaN samples of relatively high In composition similar to 47% were prepared via electrochemical etching using diluted KOH bath. The porous samples were synthesised with the assistance of different types of illumination; Xenon and UV light. Fabrication of porous InGaN without light illumination was also demonstrated. The effects of using different light sources on the properties of porous InGaN were studied for the first time. Observation through field emission scanning electron spectroscopy (FESEM) revealed that different types of illumination resulted in different surface morphologies. Overall, the high resolution X-ray diffraction (HR-XRD) rocking curves measurement showed that the value of full width at half maximum (FWHM) of all etched samples decreased relative to the as-grown sample due to removal of dislocation defects on the surface after etching. It should be noted that, etched sample that used Xenon illumination showed the lowest FWHM value. On the other hand, photoluminescence (PL) measurement indicated that all of the porous InGaN samples exhibited higher PL intensity than the as-grown sample, showing improvement in the aspect of optical property. Moreover, red-shifted characteristic in PL spectra was also observed in the porous samples, suggesting a relaxation of compressive stress occurred in the samples. The properties observed imply the potential utility of porous InGaN in optical and sensor applications. (C) 2014 Elsevier B.V. All rights reserved.
引用
收藏
页码:107 / 112
页数:6
相关论文
共 32 条
  • [1] Abud SH, 2012, INT J ELECTROCHEM SC, V7, P10038
  • [2] Enhancing hydrogen sensitivity of porous GaN by using simple and low cost photoelectrochemical etching techniques
    Al-Heuseen, K.
    Hashim, M. R.
    [J]. SENSORS AND ACTUATORS B-CHEMICAL, 2012, 163 (01) : 159 - 164
  • [3] Davydov VY, 2002, PHYS STATUS SOLIDI B, V234, P787, DOI 10.1002/1521-3951(200212)234:3<787::AID-PSSB787>3.0.CO
  • [4] 2-H
  • [5] Morphology and luminescence of porous GaN generated via Pt-assisted electroless etching
    Díaz, DJ
    Williamson, TL
    Adesida, I
    Bohn, PW
    Molnar, RJ
    [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 2002, 20 (06): : 2375 - 2383
  • [6] Catalyst and processing effects on metal-assisted chemical etching for the production of highly porous GaN
    Geng, Xuewen
    Duan, Barrett K.
    Grismer, Dane A.
    Zhao, Liancheng
    Bohn, Paul W.
    [J]. SEMICONDUCTOR SCIENCE AND TECHNOLOGY, 2013, 28 (06)
  • [7] Gil B., 1998, Group III nitride semiconductor compounds Physics and applications
  • [8] Enhanced ultraviolet photoconductivity in porous GaN prepared by metal-assisted electroless etching
    Guo, X. Y.
    Williamson, T. L.
    Bohn, P. W.
    [J]. SOLID STATE COMMUNICATIONS, 2006, 140 (3-4) : 159 - 162
  • [9] Hartono H., 2007, APPL PHYS LETT, V90
  • [10] Schottky junction/ohmic contact behavior of a nanoporous TiO2 thin film photoanode in contact with redox electrolyte solutions
    Kaneko, Masao
    Ueno, Hirohito
    Nemoto, Junichi
    [J]. BEILSTEIN JOURNAL OF NANOTECHNOLOGY, 2011, 2 : 127 - 134